Quantum yield and carbon contamination in thin-film deposition reaction by core-electron excitations
نویسندگان
چکیده
منابع مشابه
Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations
Mewlude Imam, Konstantin Gaul, Andreas Stegmueller, Carina Höglund, Jens Jensen, Lars Hultman, Jens Birch, Ralf Tonner and Henrik Pedersen, Gas phase chemical vapor deposition chemistry of triethylboron probed by boron-carbon thin film deposition and quantum chemical calculations, 2015, Journal of Materials Chemistry C, (3), 41, 10898-10906. http://dx.doi.org/10.1039/c5tc02293b Copyright: Royal...
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ژورنال
عنوان ژورنال: Applied Organometallic Chemistry
سال: 1999
ISSN: 0268-2605,1099-0739
DOI: 10.1002/(sici)1099-0739(199903)13:3<195::aid-aoc852>3.0.co;2-5